Journal
JOURNAL OF APPLIED CRYSTALLOGRAPHY
Volume 52, Issue -, Pages 1342-1347Publisher
INT UNION CRYSTALLOGRAPHY
DOI: 10.1107/S1600576719013311
Keywords
X-ray reflectivity; machine learning; organic semi-conductors; neural networks
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X-ray reflectivity (XRR) is a powerful and popular scattering technique that can give valuable insight into the growth behavior of thin films. This study shows how a simple artificial neural network model can be used to determine the thickness, roughness and density of thin films of different organic semiconductors [diindenoperylene, copper(II) phthalocyanine and alpha-sexithiophene] on silica from their XRR data with millisecond computation time and with minimal user input or a priori knowledge. For a large experimental data set of 372 XRR curves, it is shown that a simple fully connected model can provide good results with a mean absolute percentage error of 8-18% when compared with the results obtained by a genetic least mean squares fit using the classical Parratt formalism. Furthermore, current drawbacks and prospects for improvement are discussed.
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