Tip-Substrate-Distance Dependent Etching Process of III-V Semiconductors Investigated by Scanning Electrochemical Microscopy

Title
Tip-Substrate-Distance Dependent Etching Process of III-V Semiconductors Investigated by Scanning Electrochemical Microscopy
Authors
Keywords
-
Journal
Journal of Physical Chemistry C
Volume -, Issue -, Pages -
Publisher
American Chemical Society (ACS)
Online
2019-10-01
DOI
10.1021/acs.jpcc.9b07335

Ask authors/readers for more resources

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Add your recorded webinar

Do you already have a recorded webinar? Grow your audience and get more views by easily listing your recording on Peeref.

Upload Now