Insights into the atomistic behavior in diamond chemical mechanical polishing with OH environment using ReaxFF molecular dynamics simulation

Published 2019 View Full Article

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Title
Insights into the atomistic behavior in diamond chemical mechanical polishing with OH environment using ReaxFF molecular dynamics simulation
Authors
Keywords
Diamond, Chemical mechanical polishing, Removal mechanism, Molecular dynamics simulation, ReaxFF
Journal
COMPUTATIONAL MATERIALS SCIENCE
Volume 166, Issue -, Pages 136-142
Publisher
Elsevier BV
Online
2019-05-09
DOI
10.1016/j.commatsci.2019.05.001

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