4.8 Article

Controlled Spacing between Nanopatterned Regions in Block Copolymer Films Obtained by Utilizing Substrate Topography for Local Film Thickness Differentiation

Journal

ACS APPLIED MATERIALS & INTERFACES
Volume 11, Issue 38, Pages 35247-35254

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acsami.9b12817

Keywords

block copolymer; directed self-assembly; thin film

Funding

  1. Israel Science Foundation [229/17]
  2. Deutsche Forschungsgemeinschaft [SFB 1073/TPA03]

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Various types of devices require hierarchically nano-patterned substrates, where the spacing between patterned domains is controlled. Ultraconfined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns and thus opens numerous possibilities for the hierarchical construction of multifunctional devices.

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