Effects of rapid thermal annealing on structural, chemical, and electrical characteristics of atomic-layer deposited lanthanum doped zirconium dioxide thin film on 4H-SiC substrate
Effects of rapid thermal annealing on structural, chemical, and electrical characteristics of atomic-layer deposited lanthanum doped zirconium dioxide thin film on 4H-SiC substrate
Authors
Keywords
Lanthanum doped zirconium oxide, Atomic layer deposition, Rapid thermal annealing, X-ray photoelectron spectroscopy, Time-of-flight secondary ion mass spectrometry
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