Action mechanism of hydrogen gas on deposition of HfC coating using HfCl 4 -CH 4 -H 2 -Ar system

Published 2016 View Full Article

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Title
Action mechanism of hydrogen gas on deposition of HfC coating using HfCl 4 -CH 4 -H 2 -Ar system
Authors
Keywords
HfC coating, Hydrogen concentration, Microstructure, Growth behavior, Chemical vapor deposition
Journal
APPLIED SURFACE SCIENCE
Volume 390, Issue -, Pages 903-908
Publisher
Elsevier BV
Online
2016-09-10
DOI
10.1016/j.apsusc.2016.08.169

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