A high growth rate atomic layer deposition process for nickel oxide film preparation using a combination of nickel(II) diketonate–diamine and ozone

Published 2019 View Full Article

Authors

Keywords

Atomic layer deposition, NiO film, High growth rate, Nickel(II) diketonate–diamine, Ozone

Journal

APPLIED SURFACE SCIENCE

Volume 481, Issue -, Pages 138-143

Publisher

Elsevier BV

Online

2019-03-09

DOI

10.1016/j.apsusc.2019.03.071

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