Fluid simulation of the plasma uniformity in pulsed dual frequency inductively coupled plasma

Electron energy distributions and electron impact source functions in Ar/N2 inductively coupled plasmas using pulsed power

(2015) Michael D. Logue et al.   JOURNAL OF APPLIED PHYSICS

Fluid simulation of the bias effect in inductive/capacitive discharges

(2015) Yu-Ru Zhang et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Characteristics of pulsed dual frequency inductively coupled plasma

(2014) Jin Seok Seo et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Pulsed plasma etching for semiconductor manufacturing

(2014) Demetre J Economou   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Plasma dynamics in a discharge produced by a pulsed dual frequency inductively coupled plasma source

(2014) Anurag Mishra et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas

(2013) Tae Hyung Kim et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Temporal evolution of plasma potential in a large-area pulsed dual-frequency inductively coupled discharge

(2013) Anurag Mishra et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Modulation of electron energy distributions and discharge parameters in a dual frequency ICP discharge

(2013) Anurag Mishra et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Mass spectrometric study of discharges produced by a large-area dual-frequency–dual-antenna inductively coupled plasma source

(2012) Anurag Mishra et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Synergetic effects in a discharge produced by a dual frequency–dual antenna large-area ICP source

(2012) Anurag Mishra et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma

(2011) Xue-Jiao Si et al.   PHYSICS OF PLASMAS

A global (volume averaged) model of a Cl2/Ar discharge: I. Continuous power

(2010) E G Thorsteinsson et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Etching characteristics of Pb(Zr,Ti)O3, Pt, SiO2and Si3N4in an inductively coupled HBr/Ar plasma

(2010) Alexander Efremov et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching

(2008) M. Avella et al.   APPLIED PHYSICS LETTERS

Deposition of controllable preferred orientation silicon films on glass by inductively coupled plasma chemical vapor deposition

(2008) Junshuai Li et al.   JOURNAL OF APPLIED PHYSICS