Prevalence and stability of insecticide resistances in field population of Spodoptera litura (Lepidoptera: Noctuidae) from Huizhou, Guangdong Province, China

The field population of Spodoptera litura from Huizhou, Guangdong Province, China was evaluated for resistance to 21 insecticides, including conventional and new chemistry insecticides. Extreme levels of resistance were observed to metaflumizone and emamectin benzoate with resistance factors of 234.1 and 183.3, respectively. Resistance to abamectin was also high (perhaps extremely high) and over 71.9-fold. The Huizhou population of S. litura possessed high resistance to deltamethrin (96.5-fold) and moderate resistance to beta cyfluthrin and lambda cyhalothrin but remained susceptible to bifenthrin. Moderate resistance to chlorantraniliprole (22.3-fold), endosulfan (22.2-fold), tebufenozide (10.7-fold) and thiodicarb (14.3-fold), and low-level resistance to fipronil, indoxacarb and spinosad were also reported in this population. This field population remained susceptible to acetamiprid, chlorfenapyr, chlorfluazuron, hexaflumuron, chlorpyrifos, pyridalyl and spinetoram. The stabilities of resistance to metaflumizone, emamectin benzoate, deltamethrin, chlorantraniliprole and endosulfan were evaluated, the resistance level decreased when the insecticide stress was removed, suggesting stop of the application of insecticides with high level resistance could be implemented into the resistance management. Because S. litura from Huizhou developed resistance to multiple insecticides, integration of different control practices, especially the rotation of insecticides with biocontrol agents, should be performed in the management of this pest. The results suggested the suspension of the application of insecticide to which S. litura had developed high level of resistance in order to mitigate the resistance status, and the use of the insecticides to which this pest remained sensitive, including spinetoram, pyridalyl, indoxacarb, hexaflumuron, chlorfluazuron, chlorfenapyr and bifenthrin, could be incorporated into the alternating application for resistance management.