Effect of different precursors on CVD growth of molybdenum disulfide

Title
Effect of different precursors on CVD growth of molybdenum disulfide
Authors
Keywords
Chemical vapor deposition, MoS, 2, MoO, 3, Tellurium, Ammonium heptamolybdate, Raman
Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 782, Issue -, Pages 772-779
Publisher
Elsevier BV
Online
2018-12-18
DOI
10.1016/j.jallcom.2018.12.230

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