Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition

Published 2019 View Full Article

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Title
Thermal stability of nanolamellar fcc-Ti1-xAlxN grown by chemical vapor deposition
Authors
Keywords
TiAlN, Chemical vapor deposition (CVD), Phase stability, Spinodal decomposition, In situ
Journal
ACTA MATERIALIA
Volume -, Issue -, Pages -
Publisher
Elsevier BV
Online
2019-05-23
DOI
10.1016/j.actamat.2019.05.044

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