Journal
ACS NANO
Volume 13, Issue 5, Pages 5572-5582Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsnano.9b00538
Keywords
artificial epitaxy; nanoimprint lithography; guided nanowires; ZnSe; GaN; CdS; ZnTe; ZnO
Categories
Funding
- Israel Science Foundation [1493/10]
- Minerva Stiftung [711138]
- European Research Council (ERC) [338849]
- ERC Proof of Concept (PoC) Grant [838702]
- Helena and Martin Kimmel Center for Nanoscale Science
- Moskowitz Center for Nano and Bio-Nano Imaging
- Carolito Stiftung
- Clore Foundation
- European Research Council (ERC) [838702] Funding Source: European Research Council (ERC)
Ask authors/readers for more resources
The challenge of nanowire assembly is still one of the major obstacles toward their efficient integration into functional systems. One strategy to overcome this obstacle is the guided growth approach, in which the growth of in-plane nanowires is guided by epitaxial and graphoepitaxial relations with the substrate to yield dense arrays of aligned nanowires. This method relies on crystalline substrates which are generally expensive and incompatible with silicon-based technologies. In this work, we expand the guided growth approach into noncrystalline substrates and demonstrate the guided growth of horizontal nanowires along straight and arbitrarily shaped amorphous nanolithographic open guides on silicon wafers. Nanoimprint lithography is used as a high-throughput method for the fabrication of the high-resolution guiding features. We first grow five different semiconductor materials (GaN, ZnSe, CdS, ZnTe, and ZnO) along straight ridges and trenches, demonstrating the generality of this method. Through crystallographic analysis we find that despite the absence of any epitaxial relations with the substrate, the nanowires grow as single crystals in preferred crystallographic orientations. To further expand the guided growth approach beyond straight nanowires, GaN and ZnSe were grown also along curved and kinked configurations to form different shapes, including sinusoidal and zigzag-shaped nanowires. Photoluminescence and cathodoluminescence were used as noninvasive tools to characterize the sine wave-shaped nanowires. We discuss the similarities and differences between in-plane nanowires grown by epitaxy/graphoepitaxy and artificial epitaxy in terms of generality, morphology, crystallinity, and optical properties.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available