Epitaxial lateral overgrowth of α-Ga2O3 by halide vapor phase epitaxy

We demonstrate the epitaxial lateral overgrowth of alpha-Ga2O3 by halide vapor phase epitaxy. We prepared patterned SiO2 masks on a (0001) alpha-Ga2O3/sapphire template, and then alpha-Ga2O3 islands were regrown selectively on the mask windows. The islands grew vertically and laterally to coalesce with each other. Facet control of the alpha-Ga2O3 islands was achieved by controlling the growth temperature, and inclined facets developed by decreasing the temperature. Transmission electron microscopy revealed that the crystal quality of the regrown alpha-Ga2O3 was improved owing to both the blocking of dislocations by the mask and the dislocation bending by the inclined facets. (C) 2018 Author(s).