Investigation on the change of the performance of Si-Zn-Sn-O thin film transistors under negative bias temperature stress depending on the channel thickness

Title
Investigation on the change of the performance of Si-Zn-Sn-O thin film transistors under negative bias temperature stress depending on the channel thickness
Authors
Keywords
-
Journal
SOLID-STATE ELECTRONICS
Volume 153, Issue -, Pages 93-98
Publisher
Elsevier BV
Online
2018-12-27
DOI
10.1016/j.sse.2018.12.021

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