4.6 Article

Strain engineering of core-shell silicon carbide nanowires for mechanical and piezoresistive characterizations

Journal

NANOTECHNOLOGY
Volume 30, Issue 26, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/1361-6528/ab0d5d

Keywords

strain engineering; silicon carbide; nanowire; core-shell; gauge factor; MEMS

Funding

  1. JSPS KAKENHI [JP18H01335]

Ask authors/readers for more resources

This study evaluated the mechanical properties and piezoresistivity of core-shell silicon carbide nanowires (C/S-SiCNWs) synthesized by a vapor-liquid-solid technique, which are a promising material for harsh environmental micro electromechanical systems (MEMS) applications. The C/S-SiCNWs were composed of a crystalline cubic (3C) SiC core wrapped by an amorphous silicon dioxide (SiOx) shell; however, TEM observations of the NWs showed that hexagonal polytypes (2H, 4H, and 6H) were partially induced in the core by a stacking fault owing to a Shockley partial dislocation. The stress-strain relationship of the C/S-SiCNWs and SiC cores without an SiOx shell was examined using MEMS-based nanotensile tests. The tensile strengths of the C/S-SiCNWs and SiC cores were 7.0 GPa and 22.4 GPa on average, respectively. The lower strength of the C/S-SiCNWs could be attributed to the SiOx shell with the surface roughness as the breaking point. The Young's modulus of the C/S-SiCNWs was 247.2 GPa on average, whereas that of the SiC cores had a large value with scatter data ranging from 450 to 580 GPa. The geometrical model of the SiC core based on the transmission electron microscopy observations rationalized this scatter data by the volume content of the stacking fault in the core. The piezoresistive effects of the C/S-SiCNW and SiC core were also evaluated from the I-V characteristics under uniaxial tensile strain. The gauge factor of -30.7 at 0.008 epsilon for the C/S-SiCNW was approximately two-times larger than that of -15.8 at 0.01 epsilon for the SiC core. This could be caused by an increase of the surface state density at the SiOx/SiC interface owing to the positive fixed oxide charge of the SiOx shell.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available