4.6 Article

An investigation of the influence of thermal process on the electrical conductivity of LIFT printed Cu structures

Journal

JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 52, Issue 28, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/1361-6463/ab137e

Keywords

LIFT; laser induced forward transfer; 3D printing; annealing; copper

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The electrical properties of copper tracks printed by laser-induced-forward-transfer (LIFT) are typically inferior to the bulk values. Several limiting factors have been indicated such as oxidation, droplet boundaries and grain boundaries. However, the relative contribution of each of these factors has not been determined. To improve the electrical properties of LIFT printed structures, an analysis of various factors is essential. Here, we concentrate on the effect of post-printing thermal treatment on LIFT printed copper structures. A reduction in electrical resistivity by a factor of similar to 3 is obtained resulting in a value lower than 3 times the bulk copper value (1.68 mu Omega.cm). Real time resistance measurements indicate that an efficient thermal annealing can be achieved at 200 degrees C-300 degrees C within a couple of minutes. The morphological changes associated with such thermal treatment were analyzed using HR-SEM and XRD and highlight the role of stress relief, grain growth and formation of new grains primarily at the inter-droplet interfaces.

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