Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water

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Title
Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 31, Issue 4, Pages 1304-1317
Publisher
American Chemical Society (ACS)
Online
2019-01-30
DOI
10.1021/acs.chemmater.8b04456

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