Journal
ADVANCED MATERIALS
Volume 28, Issue 16, Pages 3069-3077Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/adma.201505218
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Funding
- National Research Foundation (NRF) - Ministry of Science, ICT & Future Planning [2013R1A2A1A01015232]
- National Research Foundation of Korea [2013R1A2A1A01015232] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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A mogul-patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul-patterned poly( dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul-patterned stretchable substrate shows great promise for stretchable electronics.
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