Effects of radio frequency power and gas ratio on barrier properties of SiOxNy films deposited by inductively coupled plasma chemical vapor deposition

Published 2018 View Full Article

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Title
Effects of radio frequency power and gas ratio on barrier properties of SiOxNy films deposited by inductively coupled plasma chemical vapor deposition
Authors
Keywords
Organic light emitting diode, Barrier film, Inductively coupled plasma chemical vapor deposition, Charged nanoparticles, Aggregation, Film density
Journal
THIN SOLID FILMS
Volume 669, Issue -, Pages 108-113
Publisher
Elsevier BV
Online
2018-10-11
DOI
10.1016/j.tsf.2018.10.016

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