Improvement of contact resistance in flexible a-IGZO thin-film transistors by CF4/O2 plasma treatment

Published 2018 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Improvement of contact resistance in flexible a-IGZO thin-film transistors by CF4/O2 plasma treatment
Authors
Keywords
a-IGZO, Flexible electronics, Thin-film transistor, Contact resistance, Plasma treatment, CF, 4
Journal
SOLID-STATE ELECTRONICS
Volume 150, Issue -, Pages 23-27
Publisher
Elsevier BV
Online
2018-10-06
DOI
10.1016/j.sse.2018.10.002

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.