Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation

Title
Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
Authors
Keywords
High-k thin films, Doped barium titanate, Plasma-enhanced ALD, DRAM capacitor
Journal
ACTA MATERIALIA
Volume 117, Issue -, Pages 153-159
Publisher
Elsevier BV
Online
2016-07-18
DOI
10.1016/j.actamat.2016.07.018

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