Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions

Published 2016 View Full Article

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Title
Prospects for Thermal Atomic Layer Etching Using Sequential, Self-Limiting Fluorination and Ligand-Exchange Reactions
Authors
Keywords
-
Journal
ACS Nano
Volume 10, Issue 5, Pages 4889-4894
Publisher
American Chemical Society (ACS)
Online
2016-05-25
DOI
10.1021/acsnano.6b02991

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