Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor

Published 2016 View Full Article

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Title
Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume 8, Issue 32, Pages 20865-20871
Publisher
American Chemical Society (ACS)
Online
2016-07-22
DOI
10.1021/acsami.6b06175

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