Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O

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Title
Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(NtBu)(NEt2)3, Ta(NtBu)(NEt2)2Cp, and H2O
Authors
Keywords
-
Journal
ACS Applied Materials & Interfaces
Volume 9, Issue 1, Pages 537-547
Publisher
American Chemical Society (ACS)
Online
2016-12-13
DOI
10.1021/acsami.6b11613

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