High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

Published 2018 View Full Article

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Title
High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures
Authors
Keywords
High molecular weight, PDMS-rich PS-, b, -PDMS, Hard mask, TiO, 2, Antireflection coating, Solar cells, Gallium nitride
Journal
JOURNAL OF COLLOID AND INTERFACE SCIENCE
Volume 534, Issue -, Pages 420-429
Publisher
Elsevier BV
Online
2018-09-13
DOI
10.1016/j.jcis.2018.09.040

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