Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

Published 2018 View Full Article

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Title
Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films
Authors
Keywords
HfO, 2, thin films, Microstructure, Optical properties, Residual stress, Laser induced damage threshold
Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 771, Issue -, Pages 373-381
Publisher
Elsevier BV
Online
2018-09-02
DOI
10.1016/j.jallcom.2018.08.327

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