Development of Solute-solvent Separation Soft Lithography Grating for Measuring High-temperature In situ Deformation Using Scanning Electron Microscope Moiré Method
Development of Solute-solvent Separation Soft Lithography Grating for Measuring High-temperature In situ Deformation Using Scanning Electron Microscope Moiré Method
Authors
Keywords
Solute-solvent separation soft lithography, SEM moiré, High temperature, Linear thermal expansion coefficient, Displacement and strain fields
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