Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma

Published 2018 View Full Article

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Title
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma
Authors
Keywords
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Journal
ACS Applied Materials & Interfaces
Volume 10, Issue 44, Pages 38588-38595
Publisher
American Chemical Society (ACS)
Online
2018-10-05
DOI
10.1021/acsami.8b12767

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