Preparation of rutile TiO2 thin films by laser chemical vapor deposition method

Title
Preparation of rutile TiO2 thin films by laser chemical vapor deposition method
Authors
Keywords
rutile TiO<sub>2</sub> thin film, laser chemical vapor deposition (LCVD), laser power, total pressure, microstructure
Journal
Journal of Advanced Ceramics
Volume 2, Issue 2, Pages 162-166
Publisher
Springer Nature
Online
2013-06-03
DOI
10.1007/s40145-013-0056-y

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