4.7 Article

Epitaxial Al2O3 capacitors for low microwave loss superconducting quantum circuits

Journal

APL MATERIALS
Volume 1, Issue 4, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4822436

Keywords

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Funding

  1. National Science Foundation [DMR-0805051, ECS-0335765]
  2. IARPA [W911NF-09-1-0368]
  3. DOE Office of Basic Energy Sciences [DE-FG02-06ER46327]
  4. Direct For Mathematical & Physical Scien
  5. Division Of Materials Research [0805051] Funding Source: National Science Foundation

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We have characterized the microwave loss of high-Q parallel plate capacitors fabricated from thin-film Al/Al2O3/Re heterostructures on (0001) Al2O3 substrates. The superconductor-insulator-superconductor trilayers were grown in situ in a hybrid deposition system: the epitaxial Re base and polycrystalline Al counterelectrode layers were grown by sputtering, while the epitaxial Al2O3 layer was grown by pulsed laser deposition. Structural analysis indicates a highly crystalline epitaxial Al2O3 layer and sharp interfaces. The measured intrinsic (low-power, low-temperature) quality factor of the resonators is as high as 3 x 10(4). These results indicate that low-loss grown Al2O3 is an attractive candidate dielectric for high-fidelity superconducting qubit circuits. (C) 2013 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.

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