High-reproducibility, flexible conductive patterns fabricated with silver nanowire by drop or fit-to-flow method

An unusual strategy was designed to fabricate conductive patterns with high reproducibility for flexible electronics by drop or fit-to-flow method. Silver nanowire (SNW) ink with surface tension of 36.9 mN/m and viscosity of 13.8 mPa s at 20A degrees C was prepared and characterized using a field emission transmission electron microscope, X-ray diffractometer, thermogravimetric analyzer, scanning electron microscope, and four-point probe. Polydimethylsiloxane (PDMS) pattern as template was fabricated by spin coating (500 rpm), baking at 80A degrees C for 3 h, and laser cutting. The prepared SNW ink can flow along the trench of the PDMS pattern spontaneously, especially after plasma treatment with oxygen, and show a low resistivity of 12.9 mu I (c) cm after sintering at 125A degrees C for 30 min. In addition, an antenna pattern was also prepared to prove the feasibility of the approach.