Journal
JOURNAL OF MATERIALS CHEMISTRY A
Volume 1, Issue 1, Pages 55-58Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c2ta00503d
Keywords
-
Ask authors/readers for more resources
Freestanding silicon films with a thickness ranging from 1 nm to several micrometers were prepared by Cat-CVD onto ionic liquid ([BMIM][BF4]) surfaces for the first time. The films, obtained without a solid substrate, can be facilely characterized by TEM and AFM to study the film formation and growth process.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available
Share Paper
