Evolution of Filament Formation in Ni/HfO2/SiOx/Si-Based RRAM Devices

Title
Evolution of Filament Formation in Ni/HfO2/SiOx/Si-Based RRAM Devices
Authors
Keywords
-
Journal
Advanced Electronic Materials
Volume 1, Issue 11, Pages 1500130
Publisher
Wiley
Online
2015-10-09
DOI
10.1002/aelm.201500130

Ask authors/readers for more resources

Publish scientific posters with Peeref

Peeref publishes scientific posters from all research disciplines. Our Diamond Open Access policy means free access to content and no publication fees for authors.

Learn More

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started