Irregular shaping of polystyrene nanosphere array by plasma etching

The morphology of nanospheres is crucial for designing the nanofabrication in the nanosphere lithography. Here, by plasma etching, the controllable tailoring of the nanosphere is realized and its morphology dependence on the initial shape, microscopic roughness, and the etching conditions is investigated quantitatively. The results show that the shape evolution strongly depends on the etching gas, power, and process duration. Particularly, the aspect ratio (diameter/height) significantly increases with violent etching, turning the spherical shape into tiny ellipsoidal nanoparticles. The findings are practical to the protocol of non-uniform etching of nanoobjects and provide the useful design tool for the device fabrication at nanoscale.