Journal
OPTICAL MATERIALS EXPRESS
Volume 1, Issue 4, Pages 754-765Publisher
OPTICAL SOC AMER
DOI: 10.1364/OME.1.000754
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Since its demonstration in 2003, Bragg grating inscription with high-power femtosecond pulse duration infrared sources and phase masks has proven to be an effective and far more versatile approach to grating fabrication than the conventional ultraviolet laser technique. The ultrafast IR laser-based process allows for the creation of grating structures in glassy and crystalline material waveguides that are not typically UV-photosensitive, thereby creating new applications for Bragg gratings. In this paper we will review studies that have been performed on the development and applications of the ultrafast laser technique to fabricate gratings in various optical fibers and waveguides using phase masks. (C) 2011 Optical Society of America
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