Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

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Title
Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials
Authors
Keywords
-
Journal
Beilstein Journal of Nanotechnology
Volume 5, Issue -, Pages 577-586
Publisher
Beilstein Institut
Online
2014-05-06
DOI
10.3762/bjnano.5.68

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