Structural Analyses of Thin SiO2 Films Formed by Thermal Oxidation of Atomically Flat Si Surface by Using Synchrotron Radiation X-Ray Characterization

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Title
Structural Analyses of Thin SiO2 Films Formed by Thermal Oxidation of Atomically Flat Si Surface by Using Synchrotron Radiation X-Ray Characterization
Authors
Keywords
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Journal
ECS Journal of Solid State Science and Technology
Volume 4, Issue 8, Pages N96-N98
Publisher
The Electrochemical Society
Online
2015-06-17
DOI
10.1149/2.0131508jss

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