Formation of SiO2 surface textures via CHF3/Ar plasma etching process of poly methyl methacrylate self-formed masks

Published 2013 View Full Article

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Title
Formation of SiO2 surface textures via CHF3/Ar plasma etching process of poly methyl methacrylate self-formed masks
Authors
Keywords
-
Journal
VACUUM
Volume 101, Issue -, Pages 67-70
Publisher
Elsevier BV
Online
2013-07-17
DOI
10.1016/j.vacuum.2013.07.011

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