Experimental study of the effect of process parameters on plasma-enhanced chemical vapour deposition of silicon nitride film

Published 2011 View Full Article

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Title
Experimental study of the effect of process parameters on plasma-enhanced chemical vapour deposition of silicon nitride film
Authors
Keywords
-
Journal
VACUUM
Volume 86, Issue 4, Pages 386-390
Publisher
Elsevier BV
Online
2011-09-03
DOI
10.1016/j.vacuum.2011.08.003

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