Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH4/H2/Ar by microwave plasma chemical vapor deposition

Published 2010 View Full Article

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Title
Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH4/H2/Ar by microwave plasma chemical vapor deposition
Authors
Keywords
-
Journal
VACUUM
Volume 84, Issue 11, Pages 1347-1352
Publisher
Elsevier BV
Online
2010-03-11
DOI
10.1016/j.vacuum.2010.03.002

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