Journal
ULTRAMICROSCOPY
Volume 133, Issue -, Pages 62-66Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.ultramic.2013.05.005
Keywords
AFM probes; Conducting AFM; Electron-beam-induced deposition
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We report on the fabrication of electrically conducting, ultra-sharp, high-aspect ratio probes for atomic force microscopy by electron-beam-induced deposition of platinum. Probes of 4.0 perpendicular to 1.0 nm radius-of-curvature are routinely produced with high repeatability and near-100% yield. Contact-mode topographical imaging of the granular nature of a sputtered gold surface is used to assess the imaging performance of the probes, and the derived power spectral density plots are used to quantify the enhanced sensitivity as a function of spatial frequency. The ability of the probes to reproduce high aspect-ratio features is illustrated by imaging a close-packed array of nanospheres. The electrical resistance of the probes is measured to be of order 100 k Omega. 2013 Elsevier B.V. All rights reserved,
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