Properties and electric characterizations of tetraethyl orthosilicate-based plasma enhanced chemical vapor deposition oxide film deposited at 400°C for through silicon via application

Published 2013 View Full Article

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Title
Properties and electric characterizations of tetraethyl orthosilicate-based plasma enhanced chemical vapor deposition oxide film deposited at 400°C for through silicon via application
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 550, Issue -, Pages 259-263
Publisher
Elsevier BV
Online
2013-11-13
DOI
10.1016/j.tsf.2013.11.002

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