Article
Chemistry, Inorganic & Nuclear
Juan Santo Domingo Penaranda, Mikko Nisula, Sofie S. T. Vandenbroucke, Matthias M. Minjauw, Jin Li, Andreas Werbrouck, Jonas Keukelier, Andrea I. Pitillas Martinez, Jolien Dendooven, Christophe Detavernier
Summary: Alucones have been successfully synthesized through alternating alucone MLD growth with static O-2 plasma exposures, resulting in a bilayer structure that remains stable in air. Plasma treatment densifies the top part of the alucone into Al2O3 while preserving the original alucone features and creating an intermediate carboxylate at the interface. The process has potential for encapsulation applications and thickness preservation after densification.
DALTON TRANSACTIONS
(2021)
Article
Chemistry, Inorganic & Nuclear
Ju-Hwan Han, Tae-Yeon Kim, Dong-Yeon Kim, Hae Lin Yang, Jin-Seong Park
Summary: The study evaluated gas diffusion barrier properties of aluminum oxide/alucone hybrid multi-layer structures prepared by ALD and MLD methods for flexible display devices, enhancing defense against water vapor and hydrogen diffusion. Water vapor transmission rate and hydrogen gas permeability were measured using electrical calcium tests and vacuum time-lag, respectively.
DALTON TRANSACTIONS
(2021)
Article
Materials Science, Multidisciplinary
Sebastien Buchwalder, Florian Bourgeois, Juan J. Diaz Leon, Andreas Hogg, Jurgen Burger
Summary: The demand for ultra-tight encapsulation solutions with excellent barrier and high conformality properties has increased in recent years. This study evaluates the capabilities of well-established silicon-based PECVD and metal oxide ALD barrier coatings deposited at low temperatures for high-level 3D encapsulation applications. The parylene-AlOx stack emerges as one of the most effective solutions.
Article
Chemistry, Inorganic & Nuclear
Da-Ae Park, Ji Young Son, Ji Min Seo, Bo Keun Park
Summary: Four Mo(II) and W(II) compounds were synthesized and characterized. The molecular structures of two compounds were almost identical with a pseudo-octahedral geometry. The thermogravimetric analysis showed higher residues for these compounds compared to the expected values, but they were volatile and sublimed at relatively low temperatures. The tungsten compound exhibited good durability under high temperature conditions.
INORGANIC CHEMISTRY
(2023)
Article
Electrochemistry
Ortal Lidor-Shalev, Nicole Leifer, Michal Ejgenberg, Hagit Aviv, Ilana Perelshtein, Gil Goobes, Malachi Noked, Rosy
Summary: The study involves coating LiCoO2 (LCO) with hybrid organic-inorganic alucone thin films to enable high voltage operation, improve electrochemical performance, cycling stability, and specific capacity. Among the films studied, the 10nm ethylene glycol/Al coated LCO showed the best results.
BATTERIES & SUPERCAPS
(2021)
Article
Nanoscience & Nanotechnology
Yujin Lee, Taewook Nam, Seunggi Seo, Hwi Yoon, Il-Kwon Oh, Chong Hwon Lee, Hyukjoon Yoo, Hyun Jae Kim, Wonjun Choi, Seongil Im, Joon Young Yang, Dong Wook Choi, Choongkeun Yoo, Ho-Jin Kim, Hyungjun Kim
Summary: The study demonstrates the excellent hydrogen barrier properties of ALD-grown Al2O3 in improving the stability of a-IGZO TFTs. Different behaviors were observed when hydrogen was incorporated into H2O-Al2O3 and O3-Al2O3, with O3-Al2O3 showing remarkable hydrogen barrier performance.
ACS APPLIED MATERIALS & INTERFACES
(2021)
Article
Materials Science, Multidisciplinary
Zhongchao Zhou, Xu Zhang, Rui Xu, Lina Xu, Yihong Ding, Hongping Xiao, Xinhua Li, Aidong Li, Guoyong Fang
Summary: The ALD/MLD mechanism of alucone was investigated using density functional theory calculations. It was found that three organic precursors can react with the surface through four-membered ring and six-membered ring pathways, with the latter being more favorable. The reactivity order of the precursors is EG > OX > EDA. The reactivity order of trimethylaluminum (TMA) on different surfaces is also in accordance with that of the precursors. These findings provide theoretical guidance for the design and growth of metalcone organic-inorganic hybrid materials through ALD/MLD.
MATERIALS TODAY COMMUNICATIONS
(2023)
Article
Nanoscience & Nanotechnology
Nahid Sultan Al-Mamun, Douglas E. Wolfe, Aman Haque, Jae-Gyun Yim, Seong Keun Kim
Summary: A room temperature annealing method using electron impulse force is demonstrated to significantly improve the crystallinity and reduce the resistivity of tin disulfide, which is important for post-synthesis annealing applications that require high temperature and special environments.
SCRIPTA MATERIALIA
(2023)
Article
Chemistry, Physical
Ying Wu, Er-Tao Hu, Qing-Yuan Cai, Jing Wang, Zheng-Yong Wang, Hua-Tian Tu, Ke-Han Yu, Liang-Yao Chen, Wei Wei
Summary: By employing ALD Al2O3 layer, diffusion of metal atoms in the multilayer solar selective absorber was effectively suppressed, enhancing its thermal stability. The designed sample exhibited high solar absorptance and low thermal emittance, and demonstrated stable operation at 500 degrees C, making it suitable for applications in middle-temperature solar thermal conversion systems.
APPLIED SURFACE SCIENCE
(2021)
Article
Chemistry, Inorganic & Nuclear
Hardik Jain, Mariadriana Creatore, Paul Poodt
Summary: This study investigates the molecular layer deposition (MLD) of alucone using dimethylaluminum isopropoxide (DMAI) as an alternative precursor to trimethylaluminum (TMA). The results show that the overall growth-per-cycle (GPC) decreases with increasing deposition temperature and increasing reactant purge times. The chemical environment and degradation of the DMAI alucone films are found to have striking similarities with the films prepared using TMA and ethylene glycol (EG). This study provides valuable insights for designing efficient MLD processes in the future.
DALTON TRANSACTIONS
(2022)
Article
Chemistry, Multidisciplinary
Xinzhi Li, Marko Vehkamaki, Mykhailo Chundak, Kenichiro Mizohata, Anton Vihervaara, Markku Leskela, Matti Putkonen, Mikko Ritala
Summary: This paper presents the preparation process and characterization of boron-doped Al2O3 thin films using atomic layer deposition. The effects of deposition temperature and annealing process on the properties of the films are investigated. The boron-doped Al2O3 film deposited at 200 degrees C shows low leakage current and a dielectric constant of 5.18 when the film thickness is 70 nm.
ADVANCED MATERIALS INTERFACES
(2023)
Article
Materials Science, Multidisciplinary
Gregory Burwell, Klaudia Rejnhard, Jon Evans, Jacob Mitchell, Michael T. Grimes, Matt Elwin, Ardalan Armin, Paul Meredith
Summary: High-quality alumina thin films are widely used in electronics and various applications as dielectrics, passivation layers, and barrier layers. This study demonstrates the versatility of utilizing a deposition method called MVD to grow alumina thin films on silicon substrates at low deposition temperatures (35-150 degrees C). The resulting films exhibit fully stoichiometric Al2O3 composition at deposition temperatures as low as 100 degrees C and possess excellent dielectric properties compared to typical thermal ALD layers deposited at higher temperatures.
ADVANCED ENGINEERING MATERIALS
(2023)
Article
Chemistry, Multidisciplinary
Ji Young Son, Su Han Kim, Ji Min Seo, Jongsun Lim, Taek-Mo Chung, Bo Keun Park
Summary: To replace corrosive halogen ligands, we synthesized novel tungsten complexes with amido ligands, W-(DMEDA)(3) (1) and W-(DEEDA)(3) (2) (DMEDA= N,N '-dimethylethylenediamido; DEEDA = N,N '-diethylethylenediamido). Complexes 1 and 2 were characterized and their thermal properties were analyzed. The WS2 deposition test was performed using 1 in thermal chemical vapor deposition (thermal CVD), and the surface of the thin films was further analyzed.
Article
Chemistry, Multidisciplinary
Yang Yang, Haiyan Pei, Zejun Ye, Jiaming Sun
Summary: Amorphous Al2O3-Y2O3:Er nanolaminate films are prepared on silicon using atomic layer deposition, and the resulting metal-oxide-semiconductor light-emitting devices exhibit similar electroluminescence (EL) at 1530 nm. The addition of Y2O3 in Al2O3 reduces the electric field for Er excitation and significantly enhances the EL performance without affecting electron injection and radiative recombination of doped Er3+ ions. The 0.2 nm Y2O3 cladding layers for Er3+ ions increase the external quantum efficiency from around 3% to 8.7% and the power efficiency by nearly one order of magnitude to 0.12%. The EL is attributed to impact excitation of Er3+ ions by hot electrons, originated from Poole-Frenkel conduction mechanism within the Al2O3-Y2O3 matrix.
Article
Polymer Science
Sebastien Buchwalder, Aurelio Borzi, Juan J. Diaz Leon, Florian Bourgeois, Cleo Nicolier, Sylvain Nicolay, Antonia Neels, Olaf Zywitzki, Andreas Hogg, Jurgen Burger
Summary: This study investigated the thermal impact on different types of Parylene films and evaluated their potential for high-temperature applications through analysis of thermal properties, structural properties, and barrier properties.
Article
Nanoscience & Nanotechnology
Kyung-Chul Ok, Jun-Hyung Lim, Hyun-Jun Jeong, Hyun-Mo Lee, You Seung Rim, Jin-Seong Park
ACS APPLIED MATERIALS & INTERFACES
(2018)
Article
Chemistry, Physical
Su Jin Lee, Yi Rang Lim, Seulgi Ji, Seong Ku Kim, Yeoheung Yoon, Wooseok Song, Sung Myung, Jongsun Lim, Ki-Seok An, Jin-Seong Park, Sun Sook Lee
Article
Materials Science, Ceramics
Seung-Hwan Lee, Jin-Myung Choi, Jae-Hong Lim, Jozeph Park, Jin-Seong Park
CERAMICS INTERNATIONAL
(2018)
Article
Materials Science, Ceramics
Hyun-Jun Jeong, Dong-Hyun Kim, Jozeph Park, Jin-Seong Park
CERAMICS INTERNATIONAL
(2018)
Article
Materials Science, Multidisciplinary
Jung-Dae Kwon, Johwa Yang, Jin-Seong Park, Dong-Won Kang
Article
Materials Science, Multidisciplinary
Hyun-Jun Jeong, Hyun-Mo Lee, Kyung-Chul Ok, Jozeph Park, Jin-Seong Park
JOURNAL OF MATERIALS CHEMISTRY C
(2018)
Article
Chemistry, Physical
Ji-Won Jung, Dong-Won Choi, Chan Kyu Lee, Ki Ro Yoon, Sunmoon Yu, Jun Young Cheong, Chanhoon Kim, Su-Ho Cho, Jin-Seong Park, Yong Joon Park, Il-Doo Kim
Article
Chemistry, Multidisciplinary
Yonghui Lee, Seunghwan Lee, Gabseok Seo, Sanghyun Paek, Kyung Taek Cho, Aron J. Huckaba, Marco Calizzi, Dong-won Choi, Jin-Seong Park, Dongwook Lee, Hyo Joong Lee, Abdullah M. Asiri, Mohammad Khaja Nazeeruddin
Article
Nanoscience & Nanotechnology
Jung-Hoon Lee, Mi Yoo, DongHee Kang, Hyun-Mo Lee, Wan-ho Choi, Jung Woo Park, Yeonjin Yi, Hyun You Kim, Jin-Seong Park
ACS APPLIED MATERIALS & INTERFACES
(2018)
Article
Nanoscience & Nanotechnology
Hyun-Mo Lee, Hyun-Jun Jeong, Kyung-Chul Ok, You Seung Rim, Jin-Seong Park
ACS APPLIED MATERIALS & INTERFACES
(2018)
Article
Chemistry, Physical
Seunghwan Lee, GeonHo Baek, Jung-Hoon Lee, Dong-Won Choi, Bonggeun Shong, Jin-Seong Park
APPLIED SURFACE SCIENCE
(2018)
Article
Materials Science, Multidisciplinary
Ji Soo Roh, Jin-Seong Park, Jong Min Roh, Ho Bum Park, Si-Hyun Do
MATERIALS CHEMISTRY AND PHYSICS
(2018)
Article
Polymer Science
Eunmi Cho, Mac Kim, Jin-Seong Park, Sang-Jin Lee
Article
Physics, Condensed Matter
Jiazhen Sheng, Ki-Lim Han, TaeHyun Hong, Wan-Ho Choi, Jin-Seong Park
JOURNAL OF SEMICONDUCTORS
(2018)
Article
Materials Science, Multidisciplinary
Jin-seong Park, Ho Jong Lee, Sung Jin Kim
KOREAN JOURNAL OF MATERIALS RESEARCH
(2018)