Optimization of intrinsic hydrogenated amorphous silicon deposited by very high-frequency plasma-enhanced chemical vapor deposition using the relationship between Urbach energy and silane depletion fraction for solar cell application

Title
Optimization of intrinsic hydrogenated amorphous silicon deposited by very high-frequency plasma-enhanced chemical vapor deposition using the relationship between Urbach energy and silane depletion fraction for solar cell application
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 547, Issue -, Pages 256-262
Publisher
Elsevier BV
Online
2013-01-26
DOI
10.1016/j.tsf.2013.01.023

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