Nanocrystalline silicon and silicon quantum dots formation within amorphous silicon carbide by plasma enhanced chemical vapour deposition method controlling the Argon dilution of the process gases

Published 2012 View Full Article

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Keywords

Journal

THIN SOLID FILMS

Volume 522, Issue -, Pages 45-49

Publisher

Elsevier BV

Online

2012-03-06

DOI

10.1016/j.tsf.2012.02.078

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THIN SOLID FILMS

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