High rate deposition of mixed oxides by controlled reactive magnetron-sputtering from metallic targets

Title
High rate deposition of mixed oxides by controlled reactive magnetron-sputtering from metallic targets
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 520, Issue 12, Pages 4122-4126
Publisher
Elsevier BV
Online
2011-07-23
DOI
10.1016/j.tsf.2011.07.014

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