Improvement of bias stability of indium zinc oxide thin film transistors by the incorporation of hafnium fabricated by radio-frequency magnetron sputtering

Title
Improvement of bias stability of indium zinc oxide thin film transistors by the incorporation of hafnium fabricated by radio-frequency magnetron sputtering
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 519, Issue 20, Pages 6881-6883
Publisher
Elsevier BV
Online
2011-04-19
DOI
10.1016/j.tsf.2011.04.044

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