Formation of uniaxially strained SiGe by selective ion implantation technique

Title
Formation of uniaxially strained SiGe by selective ion implantation technique
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 518, Issue 9, Pages 2454-2457
Publisher
Elsevier BV
Online
2009-10-15
DOI
10.1016/j.tsf.2009.09.157

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