Journal
THIN SOLID FILMS
Volume 518, Issue 20, Pages 5871-5874Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2010.05.089
Keywords
Amorphous materials; Semiconductors; Infrared spectroscopy; Optical properties; Structural properties
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Funding
- ICTP TRIL
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Hydrogenated amorphous silicon carbon alloy films of different carbon content were prepared by Plasma Enhanced Chemical Vapor Deposition using silane and methane with helium dilution and were characterized to study their opto-electronic, structural and defective properties. A linear correlation between micro structural disorder and overall disorder has been demonstrated. Further, it has been shown that the increase in the intrinsic disorder leads to an increase in the defect density while the increase in voids results in the decrease in the mass density for the studied films. (C) 2010 Elsevier B.V. All rights reserved.
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