Fluorination of silicon carbide thin films using pure F2 gas or XeF2

Title
Fluorination of silicon carbide thin films using pure F2 gas or XeF2
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 518, Issue 23, Pages 6746-6751
Publisher
Elsevier BV
Online
2010-06-09
DOI
10.1016/j.tsf.2010.05.120

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